专利名称：Wafer probe station having full guarding 发明人：Randy J. Schwindt,Warren K. Harwood,Paul A.
Tervo
申请号：US08/100494英语儿歌下载>英语四级词组
fccc>rbt申请日：19930802
公开号：US05457398A
公开日：nect
句号英语
19951010
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摘要：A probe station includes a fully guarded chuck asmbly and connector mechanism for increasing nsitivity to low-level currents while reducing ttling times. The chuck asmbly includes a wafer- supporting first chuck element surrounded by a cond chuck element having a lower component, skirting component and upper component each with a surface portion extending opposite the first element for guarding thereof. The connector mechanism is so connected to the cond chuck element as to enable, during low-level current measurements, the potential on each component to follow that on the first chuck element as measured relative to an outer shielding enclosure surrounding each element. Leakage current from the first chuck element is thus reduced to virtually zero, hence enabling incread current nsitivity, and the reduced capacitance thus provided by the cond chuck element decreas charging periods, hence reducing ttling times. With similar operation and effect, where any signal line element of the connector mechanism is arranged exterior of its corresponding guard line element, such as adjacent the chuck asmbly or on the probe-holding asmbly, a guard enclosure is provided to surround and fully guard such signal line element in interpod relationship between that element and the outer shielding enclosure.
申请人：CASCADE MICROTECH, INC.
代理机构：Chernoff, Vilhauer, McClung & Stenzel 更多信息请下载全文后查看
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