deputymanager>高考英语作文万能模板专利名称：Lithographic apparatus and device
manufacturing method
发明人：Emiel Jozef Melanie Eusn
申请号：US11019522
申请日：20041223
公开号：US20060139586A1
公开日：
cani
天上掉馅饼英文
20060629
专利内容由知识产权出版社提供
专利附图：
摘要：A lithographic apparatus includes an illumination system configured to福山外国语小学
uniflying
condition a radiation beam, and a support structure constructed to support a patterning device. The patterning device imparts the radiation beam with a pattern in its cross-
ction to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system projects the patterned radiation beam onto a target portion of the substrate. An interferometer system measures a position of the substrate table, and generates a disturbance frequency by optical feedback. A position control system controls the position of the support structure and the substrate table on the basis of the position measurement of the interferometer system. The position control system lects a substrate table speed to prevent a positioning error due to the disturbance frequency.
申请人：Emiel Jozef Melanie Eusnfancl卸妆油好用吗
地址：Eindhoven NL
失事的意思
国籍：NL
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