专利名称：Image enhancement for multiple exposure beamslinger
发明人：Peter Ekberg
申请号：US10778668
申请日：20040213okay
possible公开号：US07285365B2开工令
公开日：
20071023bink
西安新东方英语专利内容由知识产权出版社提供
finishes摘要：An aspect of the prent invention includes a method for patterning a workpiece covered at least partly with a layer nsitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined paration in at least a first direction for exposing a pattern onto said workpiece, where said predetermined paration is fixed to an initial system pitch in said first direction, comprising the actions of: scaling a pattern pitch in said first direction to be an integer multiple of said system pitch, adjusting the initial system pitch in said first direction to be an adjusted system pitch to maintain a scale of said pattern, adjusting said predetermined paration of exposure beams to said adjusted system pitch. Other aspects of the prent invention are reflected in the detailed description, figures and claims.
申请人：Peter Ekberg
地址：Lidingö SE
译林英语四年级上册国籍：SE
代理机构：Haynes Beffel & Wolfeld LLP
vsr
dll是什么代理人：Ernst J. Beffel, Jr.
更多信息请下载全文后查看
