专利名称：Patterned chip with adjustable surface and
method for manufacturing the same
发明人：Peilin Chen,Jau-Ye Shiu,Chiung-Wen Kuo
性能英文申请号：US11400507
申请日：20060407
公开号：US20070235333A1
哈尔滨培训中心公开日：
20071011
专利内容由知识产权出版社提供
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专利附图：
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摘要：The invention is to provide a method for fabricating a patterned chip with adjustable surface including of a basic layer, an insulating layer and a layer of
biomolecules or cells. The method compris of the following steps: pre-patterning a basic layer by photolithography; coating the pre-patterned basic layer with an insulating layer, the insulating layer is placed in solution containing biomolecules or cells with external voltage applied to the insulating layer. In addition, two steps—fabricating an pattern on the insulating layer matching the pattern of the basic layer by
剑桥商务英语中级教材
photolithography and treating the patterned insulating surface with chemical, physical or
relaxing是什么意思plasma surface process treatment—can be further followed by the step of pre-patterning a basic layer by photolithography, then proceeding the remaining steps.
xuexi申请人：Peilin Chen,Jau-Ye Shiu,Chiung-Wen Kuo
地址：Taipei TW,Taipei TW,Taipei TW
大学英语学习国籍：TW,TW,TWvarious
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