rm16专利名称：Lithographic apparatus and lithography
projection method日语学习
发明人：ヴァン デ ルイト，ケヴィン,パアルフイス，バー
ト，ディナンド,ヴァン ダメ，ジャン－フィリッ
プ，サヴィエ,オンブリー，ヨハネス,ブロウ
pride是什么意思ワー，コーネリス，メルキオール,クラメル，ピエ钟道隆
chewター，ヤコブ
申请号：JP2017551296
tall申请日：20160324
公开号：JP2018513410A
公开日：
20180524
专利内容由知识产权出版社提供
专利附图：
摘要： A lithographic apparatus compris an illumination system configured to condition a radiation beam, a support for supporting a patterning device, a substrate table for holding a substrate, a patterning device for projecting the patterned radiation beam onto a target portion of the substrate And a projection system for projecting the light beam onto the object. The support is provided with a transparent layer for protecting the patterning device. The device further compris a transparent layer
deformation determination device for determining a deformation profile of the transparent layer wherein the deformation profile of the transparent layer reprents the deformation of the transparent layer during the scanning movement of the lithographic apparatus and the device is capable of scanning movement Further comprising a compensator device configured to control at least one of the projection system, the substrate table, and the support in respon to the deformation profile of the transparent layer compensating for the deformation of the transparent layer .(FIG.
申请人：エーエスエムエル ネザーランズ ビー．ブイ．
英语翻译网地址：オランダ国，ヴェルトホーフェン ５５０４ ディーアール，デ ラン ６５０１
国籍：NL
dojo代理人：稲葉 良幸，大貫 敏史，江口 昭彦，内藤 和彦
love on top
更多信息请下载全文后查看
>什么是ie
