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专利名称：Patterning apparatus
发明人：細谷 茂治，信田 和彦，船越 充夫
申请号：JP2019008928德州翻译
申请日：20190123
内向英文公开号：JP2020118817A
bernadette peters>九年级上册历史复习提纲公开日：
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20200806
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摘要：Problem to be solved: to provide a patterning apparatus in which the vacuum ultraviolet light having a wavelength of 200 nm or less is ud as parallel light, and a patterning apparatus is realized which uniformly irradiates a wider area. The light
irradiating portion 10 is scanned relative to the substrate WMultiple short arc flash lamps
11 emitting vacuum ultraviolet light13The short arc flash lampA reflecting mirror 15 for reflecting vacuum ultraviolet light emitted from 13 as parallel lightA light shielding plate 16 having a slit shaped light outgoing aperture 161 long in the conveying width direction for transmitting reflected light from the reflecting mirror 15 is provided.The short arc flash lamp13A plurality of rows are arranged along the width of the carrierAndAdjacent short arc flash lamp 1113It is characterized in that they are arranged in the direction of displacement in the conveying direction.Diagram
申请人：ウシオ電機株式会社
地址：東京都千代田区丸の内一丁目６番５号
国籍：JP
英语麦当劳代理人：五十畑 勉男
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