专利名称：Method of forming fine island patterns ofunesco是什么意思
miconductor devices
凹怎么读发明人：Chiang-Lin Shih,Shing-Yih Shih
challenging
四级考试2020报名官网申请号：US15694848
申请日：20170903
公开号：US10204783B1
reasons公开日：
rewarding
20190212
专利内容由知识产权出版社提供
专利附图：
摘要：A method of forming fine island patterns of miconductor devices includes:forming first mask pillars on a hard mask layer on a substrate; forming an upper buffer mask layer on the hard mask layer to cover the first mask pillars; forming first linear
patterns each extending along a first direction, cond linear patterns each extending along a cond direction, and third linear patterns each extending along a third direction in the hard mask layer by at least one patterning process; etching the upper buffer mask layer to form cond mask pillars on the hard mask layer; etching an expod portion of the hard mask layer expod by the first mask pillars and the cond mask pillars until portions of the substrate are etched; and removing the first mask pillars, the cond mask pillars, and remaining portions of the hard mask layer.
申请人：NANYA TECHNOLOGY CORPORATION
武汉英国留学中介地址：New Taipei TW
搭档英语怎么说
国籍：TW
代理机构：CKC & Partners Co., Ltd.
sweater是什么意思>巴西世界杯吉祥物更多信息请下载全文后查看
