专利名称：STEP PHOTOLITHOGRAPHY DEVICE AND PHOTOLITHOGRAPHY EXPOSURE METHOD 发明人：CHEN, YONGHUI,WU, LIWEI,ZHANG, JUN
申请号：CN2012/080031
申请日：20120813
公开号：WO2013/026361A1
公开日：
20130228
专利内容由知识产权出版社提供
专利附图：
摘要：A step photolithography device and a photolithography exposure method thereof. The step photolithography device includes: an illumination unit (1) for providing an exposure beam, a workpiece station (4) for supporting a ba (7) to move with six
degree of freedom within a large journey range, a mask station (2) for supporting a mask (9) to move synchronously relative to the workpiece station (4) within a small journey range during exposure, and a projection objective (6) for projecting a pattern on the mask (9) to the ba (7) according to a predetermined scale, wherein when the workpiece station (4) steps to an exposure field, the mask station (2) moves synchronously to a position corresponding to the workpiece station (4) and expo at the same time.
申请人：SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.，上海微电子装备有限公司,CHEN, Yonghui，陈勇辉,WU, Liwei，吴立伟,ZHANG, Jun，张俊
地址：201203 CN,201203 CN,201203 CN,201203 CN,201203 CN,201203 CN,201203 CN,201203 CN
国籍：CN,CN,CN,CN,CN,CN,CN,CN
代理人：SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY，上海思微知识产权代理事务所（普通合伙）
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