专利名称：Ion beam blanking device and manner 申请号：JP51001092
申请日：19920330
公开号：JPH06506794A
威尔 惠顿公开日：
arounddeal
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zaixiancidian英文歌曲经典>坦桑尼亚旅游摘要：Ion beam apparatus provides beam blanking by utilizing an aperture through which the beam pass during unblanked periods, and elements (14, 15) for deflecting the beam during blanking so that the beam is deflected away from the aperture. Electrodes (42, 44, 50) between the aperture element (16) and the deflecting elements (14, 15) generate a potential exceeding the kinetic energy of charged particles emitted from the aperture element due to ions striking the aperture element during blanking. Charged particles emitted from the aperture element are thus prevented from striking the beam deflecting elements, thereby reducing hydrocarbon cracking, insulator accumulation, and charge accumulation on the deflecting elements. Beam stability is thereby enhanced. Charged particles emitted from the aperture element are also returned to the aperture element, so that an accurate measure of ion beam current is obtained by measuring current flow to the aperture element.
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