PHYSICAL VAPOR DEPOSITION CHAMBER WITH ROTATING MA

更新时间:2023-06-26 11:48:33 阅读: 评论:0

专利名称:PHYSICAL VAPOR DEPOSITION CHAMBER
WITH ROTATING MAGNET ASSEMBLY AND
attendCENTRALLY FED RF POWER
发明人:ALAN RITCHIE,KEITH MILLER
african申请号:US13075841
申请日:20110330
panadol
公开号:US20110240466A1
点读笔ox公开日:
20111006jophine
专利内容由知识产权出版社提供
专利附图:
摘要:Embodiments of the prent invention provide improved methods and
apparatus for physical vapor deposition (PVD) processing of substrates. In some
embodiments, an apparatus for physical vapor deposition (PVD) may include a target asmbly having a target comprising a source material to be deposited on a substrate, an opposing source distribution plate dispod opposite a backside of the target and electrically coupled to the target along a peripheral edge of the target, and a cavity dispod between the backside of the target and the source distribution plate; an electrode coupled to the source distribution plate at a point coincident with a central axis of the target; and a magnetron asmbly comprising a rotatable magnet dispod within the cavity and having an axis of rotation that is aligned with a central axis of the target asmbly, wherein the magnetron asmbly is not driven through the electrode.tiger是什么意思
少儿学习申请人:ALAN RITCHIE,KEITH MILLER
地址:Menlo Park CA US,Mountain View CA US
国籍:US,US
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